Title :
Control of lead content in PLZT thin films produced using cluster magnetron sputtering
Author :
Dexter, K.F. ; Lewis, K.L. ; Chadney, J.E.
Author_Institution :
DRA Malvern, UK
fDate :
30 Aug-2 Sep 1992
Abstract :
The deposition of PLZT (lead lanthanum zirconate titanate) thin films by cluster magnetron techniques is described. X-ray photoelectron spectroscopy has been used to determine film composition over a range of substrate temperatures. As-deposited films have been studied by X-ray diffraction techniques, and the role of postdeposition annealing has been assessed. The morphology and growth rates have been determined
Keywords :
X-ray diffraction examination of materials; X-ray photoelectron spectra; crystal morphology; ferroelectric thin films; lead compounds; sputter deposition; PLZT thin films; Pb content control; PbLaZrO3TiO3; X-ray diffraction techniques; X-ray photoelectron spectroscopy; cluster magnetron sputtering; ferroelectric thin film; film composition; growth rates; morphology; postdeposition annealing; substrate temperatures; Annealing; Lanthanum; Morphology; Spectroscopy; Sputtering; Substrates; Temperature distribution; Titanium compounds; Transistors; X-ray diffraction;
Conference_Titel :
Applications of Ferroelectrics, 1992. ISAF '92., Proceedings of the Eighth IEEE International Symposium on
Conference_Location :
Greenville, SC
Print_ISBN :
0-7803-0465-9
DOI :
10.1109/ISAF.1992.300594
