P1–12: Miniature electron optics for use in a sub-micron, piezoelectric scanned, multi-electron beam lithography system

A miniaturized electron beam focusing column has been tested for use in a novel arrayed multi-electron beam lithography system using piezoelectric scan. This concept utilizes a piezoelectrically scanned target under an array of non-deflected electron beams gated on and off by computer control synchronized to the pattern to be written. Void of deflection elements the design of the electron column can be simplified so that small arrays of high energy columns operating up to 25keV can be formed. A probe radius of 90nm was measured on a single beam prototype device using a low brightness tungsten cathode. Using a high brightness Schottky TFE cathode the column has a theoretical potential to reach the 10nm regime. This paper presents the electron optical design, optimization scheme and PMMA exposure tests on silicon.