DocumentCode :
1920628
Title :
Current and Field Distribution in Film Metal-Dielectric Structures
Author :
Starostenko, V.V. ; Taran, E.P. ; Poletaev, D.A.
Author_Institution :
Tavrida Nat. Univ. 4, Simferopol
fYear :
2007
fDate :
10-14 Sept. 2007
Firstpage :
667
Lastpage :
668
Abstract :
Considered in this paper is the model of electromagnetic fields influence on film metal-dielectric structures using High Frequency Structure Simulator (HFSS). Fields and currents distribution in metal-dielectric structures for some types of structures have been obtaibed.
Keywords :
current distribution; dielectric thin films; electromagnetic fields; current-field distribution; electromagnetic fields; film metal-dielectric structures; high frequency structure simulator; Aluminum; Electromagnetic scattering; Electromagnetic waveguides; Frequency; Glass; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave & Telecommunication Technology, 2007. CriMiCo 2007. 17th International Crimean Conference
Conference_Location :
Crimea
Print_ISBN :
978-966-335-012-7
Type :
conf
DOI :
10.1109/CRMICO.2007.4368895
Filename :
4368895
Link To Document :
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