• DocumentCode
    1920671
  • Title

    Deposition and properties of PLT thin films by magnetron sputtering from powder target

  • Author

    Luo, Wei-Gen ; Ding, Ai-Li ; Zhang, Rui-Tao ; Huang, Yu-Hong ; Ge, Min

  • Author_Institution
    Shanghai Inst. of Ceramics, Chinese Acad. of Sci., China
  • fYear
    1992
  • fDate
    30 Aug-2 Sep 1992
  • Firstpage
    19
  • Lastpage
    22
  • Abstract
    The processes, structures, and electrooptical properties of lanthanum-modified lead titanate (PLT) thin films prepared by RF magnetron sputtering from sintered powder targets were studied. Highly oriented PLT thin films on glass and (0001) Al2O3 substrate, and epitaxial PLT thin films and (100) SrTiO3 have been deposited. The growth mechanism of oriented PLT thin film on amorphous glass is discussed. The electrooptical coefficient (R>0.6×10-16 m2/v2) of PLT films on glass was measured by a method based on the Faraday magnetooptical effect
  • Keywords
    Faraday effect; electro-optical effects; epitaxial layers; ferroelectric thin films; lanthanum compounds; lead compounds; sputter deposition; sputtered coatings; (PbLa)TiO3; Al2O3 substrate; Faraday magnetooptical effect; SrTiO3; amorphous glass; electrooptical coefficient; electrooptical properties; epitaxial (Pb,La)TiO3 thin films; growth mechanism; powder target; radiofrequency magnetron sputtering; Amorphous magnetic materials; Amorphous materials; Glass; Magnetic properties; Powders; Radio frequency; Sputtering; Substrates; Titanium compounds; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 1992. ISAF '92., Proceedings of the Eighth IEEE International Symposium on
  • Conference_Location
    Greenville, SC
  • Print_ISBN
    0-7803-0465-9
  • Type

    conf

  • DOI
    10.1109/ISAF.1992.300611
  • Filename
    300611