DocumentCode
1920671
Title
Deposition and properties of PLT thin films by magnetron sputtering from powder target
Author
Luo, Wei-Gen ; Ding, Ai-Li ; Zhang, Rui-Tao ; Huang, Yu-Hong ; Ge, Min
Author_Institution
Shanghai Inst. of Ceramics, Chinese Acad. of Sci., China
fYear
1992
fDate
30 Aug-2 Sep 1992
Firstpage
19
Lastpage
22
Abstract
The processes, structures, and electrooptical properties of lanthanum-modified lead titanate (PLT) thin films prepared by RF magnetron sputtering from sintered powder targets were studied. Highly oriented PLT thin films on glass and (0001) Al2O3 substrate, and epitaxial PLT thin films and (100) SrTiO3 have been deposited. The growth mechanism of oriented PLT thin film on amorphous glass is discussed. The electrooptical coefficient (R>0.6×10-16 m2/v2) of PLT films on glass was measured by a method based on the Faraday magnetooptical effect
Keywords
Faraday effect; electro-optical effects; epitaxial layers; ferroelectric thin films; lanthanum compounds; lead compounds; sputter deposition; sputtered coatings; (PbLa)TiO3; Al2O3 substrate; Faraday magnetooptical effect; SrTiO3; amorphous glass; electrooptical coefficient; electrooptical properties; epitaxial (Pb,La)TiO3 thin films; growth mechanism; powder target; radiofrequency magnetron sputtering; Amorphous magnetic materials; Amorphous materials; Glass; Magnetic properties; Powders; Radio frequency; Sputtering; Substrates; Titanium compounds; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 1992. ISAF '92., Proceedings of the Eighth IEEE International Symposium on
Conference_Location
Greenville, SC
Print_ISBN
0-7803-0465-9
Type
conf
DOI
10.1109/ISAF.1992.300611
Filename
300611
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