DocumentCode :
1920915
Title :
7.1: A microsystems enabled field desorption source
Author :
Resnick, Paul J. ; Holland, Christopher E. ; Schwoebel, Paul R. ; Hertz, Kristin L. ; Chichester, David L.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
fYear :
2010
fDate :
26-30 July 2010
Firstpage :
104
Lastpage :
105
Abstract :
Technologies that have been developed for microelectromechanical systems (MEMS) have been applied to the fabrication of field desorption arrays. These techniques include the use of thick films for enhanced dielectric stand-off, as well as an integrated gate electrode. The increased complexity of MEMS fabrication provides enhanced design flexibility over traditional methods.
Keywords :
desorption; micromechanical devices; thick films; dielectric stand-; field desorption arrays; integrated gate electrode; microelectromechanical systems; thick films; Dielectrics; Electrodes; Fabrication; Logic gates; Silicon; Substrates; MEMS; arrays; field desorption; silicon tips;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location :
Palo Alto, CA
Print_ISBN :
978-1-4244-7889-7
Electronic_ISBN :
978-1-4244-7888-0
Type :
conf
DOI :
10.1109/IVNC.2010.5563205
Filename :
5563205
Link To Document :
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