• DocumentCode
    1921186
  • Title

    Impact of Source/drain Implants on Threshold Voltage Matching in Deep Sub-micron CMOS Technologies

  • Author

    Dubois, Jerôme ; Knol, Johan ; Bolt, Mike ; Tuinhout, Hans ; Schmitz, Jurriaan ; Stolk, Peter

  • Author_Institution
    Philips Semiconductors, Nijmegen, The Netherlands
  • fYear
    2002
  • fDate
    24-26 September 2002
  • Firstpage
    115
  • Lastpage
    118
  • Keywords
    CMOS process; CMOS technology; Circuits; Fasteners; Fluctuations; Implants; MOS devices; MOSFETs; Morphology; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
  • Print_ISBN
    88-900847-8-2
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2002.194883
  • Filename
    1503813
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1921186