Title :
Impact of Source/drain Implants on Threshold Voltage Matching in Deep Sub-micron CMOS Technologies
Author :
Dubois, Jerôme ; Knol, Johan ; Bolt, Mike ; Tuinhout, Hans ; Schmitz, Jurriaan ; Stolk, Peter
Author_Institution :
Philips Semiconductors, Nijmegen, The Netherlands
fDate :
24-26 September 2002
Keywords :
CMOS process; CMOS technology; Circuits; Fasteners; Fluctuations; Implants; MOS devices; MOSFETs; Morphology; Threshold voltage;
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
DOI :
10.1109/ESSDERC.2002.194883
