• DocumentCode
    1921419
  • Title

    2.5: Enhanced field emission from nanowires of silicon carbide by thermal heating

  • Author

    Deng, Shaozhi ; Xu, Haitao ; Zhen, Xingguo ; Xu, Ningsheng

  • Author_Institution
    State Key Lab. of Optoelectron. Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
  • fYear
    2010
  • fDate
    26-30 July 2010
  • Firstpage
    9
  • Lastpage
    10
  • Abstract
    The temperature dependence of field emission properties of silicon carbide (SiC) nanowires was studied in a range from 27°C to 300°C by using transparent anode technique. The SiC nanowires of diameter of around 15 nm were grown on silicon carbide substrate by thermal heating using iron as catalyst. The results show that above a threshold temperature, the field emission current increases significantly with increasing temperature. As a consequence, the turn-on field for obtaining emission current density of 10 μA/cm2 decreases from 4.25 MV/m at 27°C to 1.23 MV/m at 300°C. The physical explanation was given to the experimental observation.
  • Keywords
    current density; electron field emission; nanowires; semiconductor growth; silicon compounds; wide band gap semiconductors; SiC; emission current density; enhanced field emission; silicon carbide nanowires; temperature 27 degC to 300 degC; temperature dependence; thermal heating; threshold temperature; transparent anode technique; turn-on field; Electron emission; Heating; Nanowires; Scanning electron microscopy; Silicon carbide; Substrates; Silicon carbide nanowires; enhanced field emission; temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
  • Conference_Location
    Palo Alto, CA
  • Print_ISBN
    978-1-4244-7889-7
  • Electronic_ISBN
    978-1-4244-7888-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2010.5563222
  • Filename
    5563222