DocumentCode
1921419
Title
2.5: Enhanced field emission from nanowires of silicon carbide by thermal heating
Author
Deng, Shaozhi ; Xu, Haitao ; Zhen, Xingguo ; Xu, Ningsheng
Author_Institution
State Key Lab. of Optoelectron. Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
fYear
2010
fDate
26-30 July 2010
Firstpage
9
Lastpage
10
Abstract
The temperature dependence of field emission properties of silicon carbide (SiC) nanowires was studied in a range from 27°C to 300°C by using transparent anode technique. The SiC nanowires of diameter of around 15 nm were grown on silicon carbide substrate by thermal heating using iron as catalyst. The results show that above a threshold temperature, the field emission current increases significantly with increasing temperature. As a consequence, the turn-on field for obtaining emission current density of 10 μA/cm2 decreases from 4.25 MV/m at 27°C to 1.23 MV/m at 300°C. The physical explanation was given to the experimental observation.
Keywords
current density; electron field emission; nanowires; semiconductor growth; silicon compounds; wide band gap semiconductors; SiC; emission current density; enhanced field emission; silicon carbide nanowires; temperature 27 degC to 300 degC; temperature dependence; thermal heating; threshold temperature; transparent anode technique; turn-on field; Electron emission; Heating; Nanowires; Scanning electron microscopy; Silicon carbide; Substrates; Silicon carbide nanowires; enhanced field emission; temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location
Palo Alto, CA
Print_ISBN
978-1-4244-7889-7
Electronic_ISBN
978-1-4244-7888-0
Type
conf
DOI
10.1109/IVNC.2010.5563222
Filename
5563222
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