Title :
Thermal Nitridation of Chemical Dielectrics as an Easy Approach to Ultra-thin Gate Oxide Processing
Author :
Bidaud, M. ; Carrère, J-P ; Guyader, F. ; Juhel, M. ; Pantel, R.
Author_Institution :
Philips Semiconductors, Crolles Cedex, France
fDate :
24-26 September 2002
Keywords :
Chemical processes; Dielectrics;
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
DOI :
10.1109/ESSDERC.2002.194895
