Thermal Nitridation of Chemical Dielectrics as an Easy Approach to Ultra-thin Gate Oxide Processing

Author

Bidaud, M. ; Carrère, J-P ; Guyader, F. ; Juhel, M. ; Pantel, R.

Author_Institution

Philips Semiconductors, Crolles Cedex, France

fYear

2002

fDate

24-26 September 2002

Firstpage

163

Lastpage

166

Keywords

Chemical processes; Dielectrics;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2002. Proceeding of the 32nd European

Print_ISBN

88-900847-8-2

Type

DOI

10.1109/ESSDERC.2002.194895

Filename

1503825

Link To Document