DocumentCode :
1921751
Title :
A New Method for Interface State Evaluation in SOI MOSFETs using Drain Current Transients
Author :
Ionescu, A.M. ; Rusu, A. ; Chovet, A. ; Cristoloveanu, S.
Author_Institution :
University ``POLITEHNICA´´´´ Bucharest, Faculty of Electronics & Telecommunications, Splaiul Independentei, 313, Bucharest, Romania
fYear :
1994
fDate :
11-15 Sept. 1994
Firstpage :
783
Lastpage :
786
Abstract :
A new technique for the extraction of the interface state density in dual-gate SOI MOSFETs is presented. The method is based on the investigation of drain current transients by deep depletion pulsing of MOS transistors, in the weak inversion region. It is shown that this transient technique stands as a reliable monitor for radiation-induced interface traps.
Keywords :
Charge pumps; Current measurement; Equations; Interface states; MOSFETs; Radiation monitoring; Semiconductor thin films; Silicon on insulator technology; Surface charging; Transient analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
Conference_Location :
Edinburgh, Scotland
Print_ISBN :
0863321579
Type :
conf
Filename :
5435836
Link To Document :
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