Diffusion Suppression in Silicon by Substitutional C Doping

Author

Cowern, N.E.B. ; Colombeau, B. ; Roozeboom, F. ; Hopstaken, M. ; Snijders, H. ; Meunier-Beillard, P. ; Lerch, W.

Author_Institution

University of Surrey, United Kingdom

fYear

2002

fDate

24-26 September 2002

Firstpage

203

Lastpage

206

Keywords

Chemicals; Context modeling; Doping; Frequency conversion; Impurities; Laboratories; Lattices; Mathematics; Semiconductor process modeling; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2002. Proceeding of the 32nd European

Print_ISBN

88-900847-8-2

Type

DOI

10.1109/ESSDERC.2002.194905

Filename

1503835

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