Title :
Diffusion Suppression in Silicon by Substitutional C Doping
Author :
Cowern, N.E.B. ; Colombeau, B. ; Roozeboom, F. ; Hopstaken, M. ; Snijders, H. ; Meunier-Beillard, P. ; Lerch, W.
Author_Institution :
University of Surrey, United Kingdom
fDate :
24-26 September 2002
Keywords :
Chemicals; Context modeling; Doping; Frequency conversion; Impurities; Laboratories; Lattices; Mathematics; Semiconductor process modeling; Silicon;
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
DOI :
10.1109/ESSDERC.2002.194905
