DocumentCode :
1922295
Title :
Exploring Methods for Adequate Simulation of Sub-100nm Devices
Author :
Moroz, Victor ; Strecker, Norbert ; Jaraiz, Martin
Author_Institution :
Synopsys, Inc., Mountain View, CA, USA
fYear :
2002
fDate :
24-26 September 2002
Firstpage :
299
Lastpage :
302
Keywords :
Atom optics; Electronics industry; Equations; Lithography; MOSFET circuits; Optical design; Optical distortion; Rapid thermal annealing; Semiconductor process modeling; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
Type :
conf
DOI :
10.1109/ESSDERC.2002.194928
Filename :
1503858
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1922295
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