• DocumentCode
    1922896
  • Title

    Investigation of HfO2 Dielectric Stacks Deposited by ALD with a Mercury Probe

  • Author

    Garros, X. ; Leroux, C. ; Blin, D. ; Damlencourt, J.F. ; Papon, A.M. ; Reimbold, G.

  • Author_Institution
    CEA-LETI/STMicroelectronics, Grenoble, France
  • fYear
    2002
  • fDate
    24-26 September 2002
  • Firstpage
    411
  • Lastpage
    414
  • Keywords
    Annealing; Capacitance; Capacitance-voltage characteristics; Dielectric measurements; Electrical resistance measurement; Hafnium oxide; High K dielectric materials; High-K gate dielectrics; Performance evaluation; Probes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
  • Print_ISBN
    88-900847-8-2
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2002.194955
  • Filename
    1503885
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1922896