Title :
Investigation of HfO2 Dielectric Stacks Deposited by ALD with a Mercury Probe
Author :
Garros, X. ; Leroux, C. ; Blin, D. ; Damlencourt, J.F. ; Papon, A.M. ; Reimbold, G.
Author_Institution :
CEA-LETI/STMicroelectronics, Grenoble, France
fDate :
24-26 September 2002
Keywords :
Annealing; Capacitance; Capacitance-voltage characteristics; Dielectric measurements; Electrical resistance measurement; Hafnium oxide; High K dielectric materials; High-K gate dielectrics; Performance evaluation; Probes;
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
DOI :
10.1109/ESSDERC.2002.194955
