ZrO2 Gate Dielectrics Prepared by E-beam Deposition of Zr and YSZ Films and Post Annealing Processes

Author

Johansson, M. ; Yousif, M.Y.A. ; Sareen, A. ; Lundgren, P. ; Bengtsson, S. ; Södervall, U.

Author_Institution

Solid State Electronics, Chalmer Univ, Sweden, Sweden

fYear

2002

fDate

24-26 September 2002

Firstpage

419

Lastpage

422

Keywords

Annealing; Dielectrics; Zirconium;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2002. Proceeding of the 32nd European

Print_ISBN

88-900847-8-2

Type

DOI

10.1109/ESSDERC.2002.194957

Filename

1503887

Link To Document