DocumentCode
1922967
Title
Gate Dielectrics for High Performance and Low Power CMOS SoC Applications
Author
Cubaynes, F.N. ; Dachs, C.J.J. ; Detcheverry, C. ; Zegers, A. ; Venezia, V.C. ; Schmitz, J. ; Stolk, P.A. ; Jurczak, M. ; Henson, K. ; Degraeve, R. ; Rothschild, A. ; Conard, T. ; Petry, J. ; Da Rold, M. ; Schaekers, M. ; Badenes, G. ; Date, L. ; Pique, D
Author_Institution
Philips Research, Leuven, Belgium
fYear
2002
fDate
24-26 September 2002
Firstpage
427
Lastpage
430
Keywords
Annealing; Dielectrics; Furnaces; Implants; Oxidation; Plasma applications; Plasma devices; Plasma materials processing; Rapid thermal processing; System-on-a-chip;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN
88-900847-8-2
Type
conf
DOI
10.1109/ESSDERC.2002.194959
Filename
1503889
Link To Document