DocumentCode
1923316
Title
The RF Potential of High-performance 100nm CMOS Technology
Author
Venezia, V.C. ; Scholten, A.J. ; Detcheverry, C. ; Boots, H. ; Jeamsaksin, W. ; Grau, L. ; Klaassen, D.B.M. ; Velghe, R.M.D.A. ; Havens, R.J. ; Tiemeijer, L.F.
Author_Institution
Philips Research, Leuven, Belgium
fYear
2002
fDate
24-26 September 2002
Firstpage
491
Lastpage
494
Keywords
CMOS technology; Cutoff frequency; Dielectric substrates; Electrical resistance measurement; Etching; Length measurement; MOS devices; Radio frequency; Scanning electron microscopy; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN
88-900847-8-2
Type
conf
DOI
10.1109/ESSDERC.2002.194975
Filename
1503905
Link To Document