Title :
Optical properties of LiNbO3 with ion implantation and titanium thermal diffusion
Author :
You, Bin ; Zhang, Leiqi ; Yao, Xiu
Author_Institution :
Electron Mater. Res. Lab., Xi´an Jiaotong Univ.
fDate :
30 Aug-2 Sep 1992
Abstract :
The optical properties of LiNbO3 single crystal with ion implantation and thermal diffusion of titanium are studied. The separate and combined effects of the two processes are compared. A titanium film was prepared on LiNbO3 by the conventional sputtering technique and CVD (chemical vapor deposition). Thermal diffusion was achieved by annealing in a dry oxygen atmosphere at various temperatures. For a Ti film with a thickness of 20 nm, five hours are needed for complete in-diffusion. The refractive index of LiNbO3 with in-diffused Ti can vary from 10% (12%) to 8% (10%) for No (Ne). The thicker the Ti film on the sample, the smaller is the light loss. An isotropic refractive index can be obtained for an Ne-implanted LiNbO3 sample. Negative birefringence and low light loss can be achieved on samples treated by Ti thermal diffusion combined with successive Ar implantation, which is very useful for waveguide applications
Keywords :
CVD coatings; annealing; birefringence; diffusion in solids; ion implantation; lithium compounds; optical materials; optical waveguides; refractive index; sputtered coatings; thermal diffusion; 1000 C; 1050 C; 20 nm; 900 C; CVD; LiNbO3:Ar-Ti; anisotropic ellipsometry; annealing; chemical vapor deposition; dry O2 atmosphere; ion implantation; isotropic refractive index; light loss; negative birefringence; optical properties; single crystal; sputtering technique; thermal diffusion; waveguide applications; Annealing; Chemical vapor deposition; Ion implantation; Optical films; Optical refraction; Optical variables control; Particle beam optics; Refractive index; Sputtering; Titanium;
Conference_Titel :
Applications of Ferroelectrics, 1992. ISAF '92., Proceedings of the Eighth IEEE International Symposium on
Conference_Location :
Greenville, SC
Print_ISBN :
0-7803-0465-9
DOI :
10.1109/ISAF.1992.300741