DocumentCode :
1924843
Title :
Dependence of tunneling magnetoresistance on CoFe interfacial payer thickness in NiFe/Al/sub 2/O/sub 3//NiFe tunnel junction
Author :
Park, B.G. ; Lee, T.D.
Author_Institution :
Korea Advanced Institute of Science and Technology
fYear :
1999
fDate :
18-21 May 1999
Keywords :
Antiferromagnetic materials; Artificial intelligence; Electrodes; Magnetic field measurement; Magnetic tunneling; Oxidation; Plasma measurements; Saturation magnetization; Sputtering; Tunneling magnetoresistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 1999. Digest of INTERMAG 99. 1999 IEEE International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-5555-5
Type :
conf
DOI :
10.1109/INTMAG.1999.837345
Filename :
837345
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1924843
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