Developments of a MEVVA-type source for ion implantation studies

Summary form only given. An ion implantation facility incorporating a metal vapor vacuum arc (MEVVA) ion source has been in operation within the Australian Nuclear Science and Technology Organization for the past two years. To enhance performance and provide more diagnostic information, several additions and modifications have been made to the original electronic and electrical systems. In particular, the trigger power supply has been redesigned to improve the arc initiation reliability for difficult-to-trigger materials such as tungsten and silicon. The design and performance of a high-voltage (2000 V), high-impedance 5 /spl Omega/ pulse performing network (PEN) are described. This compact unit was developed to operate continuously at trigger rates in the range 0-50 Hz. The higher voltage was chosen in order to investigate the influence of pfn voltage on arc current chopping which has been observed with some cathode materials.