Title :
OCTOR: OCcurrence selecTOR in pattern hierarchies
Author :
Jang, Justin ; Rossignac, Jarek
Author_Institution :
Sch. of Interactive Comput., Georgia Inst. of Technol., Atlanta, GA
Abstract :
Hierarchies of patterns of features, of sub-assemblies, or of CSG sub-expressions are used in architectural and mechanical CAD to eliminate laborious repetitions from the design process. Yet, often the placement, shape, or even existence of a selection of the repeated occurrences in the pattern must be adjusted. The specification of a desired selection of occurrences in a hierarchy of patterns is often tedious (involving repetitive steps) or difficult (requiring interaction with an abstract representation of the hierarchy graph). The OCTOR system introduced here addresses these two drawbacks simultaneously, offering an effective and intuitive solution, which requires only two mouse-clicks to specify any one of a wide range of possible selections. It does not require expanding the graph or storing an explicit list of the selected occurrences and is simple to compute. It is hence well suited for a variety of CAD applications, including CSG, feature-based design, assembly mock-up, and animation. We discuss a novel representation of a selection, a technology that makes it possible to use only two mouse-clicks for each selection, and the persistence of these selections when the hierarchy of patterns is edited.
Keywords :
CAD; computer graphics; animation; assembly mock-up; feature-based design; mechanical CAD; occurrence selector; pattern hierarchies; Airplanes; Animation; Assembly; Brushes; Computational geometry; Computer graphics; Design automation; Process design; Shape; Solid modeling; CAD; Features; Hierarchy; I.3.5 [Computer Graphics]: Computational Geometry and Object Modeling—Object hierarchies; I.3.6 [Computer Graphics]: Methodology and Techniques—Interaction techniques; Naming; Patterns; Persistence; Selection;
Conference_Titel :
Shape Modeling and Applications, 2008. SMI 2008. IEEE International Conference on
Conference_Location :
Stony Brook, NY
Print_ISBN :
978-1-4244-2260-9
Electronic_ISBN :
978-1-4244-2261-6
DOI :
10.1109/SMI.2008.4547972