DocumentCode :
1925292
Title :
Super junction LDMOST in silicon-on-sapphire technology (SJ-LDMOST)
Author :
Nassif-Khalil, Sameh G. ; Salama, C. Andre T
Author_Institution :
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
fYear :
2002
fDate :
2002
Firstpage :
81
Lastpage :
84
Abstract :
This paper reports on a novel Super Junction LDMOST in SOS technology (SJ-LDMOST) targeting Power Integrated Circuits (PICs) and discusses a CMOS compatible process used in the implementation of the device. The proposed structure uses a simple and practical method to achieve charge compensation between the n and p SJ-pillars and a uniform electric field distribution in the forward blocking mode. 3D device simulations indicate that a significant reduction of the specific on-resistance for a given breakdown voltage can be achieved over conventional RESURF devices using a realistic aspect ratio for the SJ pillars.
Keywords :
CMOS integrated circuits; compensation; integrated circuit modelling; integrated circuit reliability; power MOSFET; power integrated circuits; semiconductor device breakdown; silicon-on-insulator; 3D device simulations; CMOS compatible process; SJ-LDMOST; SOS; Si; Silicon-On-Sapphire Technology; Super Junction LDMOST; aspect ratio; breakdown voltage; charge compensation; forward blocking mode; power integrated circuits; specific on-resistance; uniform electric field distribution; CMOS process; CMOS technology; Circuit simulation; Conductivity; Doping; Electric breakdown; MOSFETs; Mirrors; Region 2; Strontium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2002. Proceedings of the 14th International Symposium on
Print_ISBN :
0-7803-7318-9
Type :
conf
DOI :
10.1109/ISPSD.2002.1016176
Filename :
1016176
Link To Document :
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