Title :
New SiGe power bipolar transistors with the optimum base and emitter structures
Author :
Hirose, Fumihoko ; Souda, Y. ; Nakano, K. ; Okumura, S.
Author_Institution :
Adv. Technol. Res. Center, Mitsubishi Heavy Ind. Ltd., Yokohama, Japan
Abstract :
We have newly developed SiGe power-bipolar-transistors with optimum base and emitter structures. The presented SiGe transistor allows fast switching operation of less than 100 ns, while the low on-state voltage drop of 0.2 V has been achieved at a current density of 113 A/cm2. The optimized transistor with poly-Si emitter, minimized SiGe layer, and interconnect structure, enables very high current gain of ∼200 at a high current region exceeding 100 A/cm2. The presented SiGe transistors are effective in lower power dissipation in switching circuits.
Keywords :
Ge-Si alloys; current density; elemental semiconductors; optimisation; power bipolar transistors; semiconductor device manufacture; semiconductor device measurement; semiconductor materials; silicon; 0.2 V; 100 ns; Si-SiGe; SiGe/polysilicon power bipolar transistors; current density; device current gain; device interconnect structure; fast switching operation; high current region; low on-state voltage drop; minimized SiGe layer; optimized transistor; optimum base structures; optimum emitter structures; poly-Si emitter; switching circuit applications; transistor power dissipation; Bipolar transistors; Current density; Doping; Electricity supply industry; Germanium silicon alloys; Integrated circuit interconnections; Low voltage; MOSFETs; Silicon germanium; Switching circuits;
Conference_Titel :
Power Semiconductor Devices and ICs, 2002. Proceedings of the 14th International Symposium on
Print_ISBN :
0-7803-7318-9
DOI :
10.1109/ISPSD.2002.1016198