DocumentCode
1926157
Title
Break-through of the Si limit under 300 V breakdown voltage with new concept power device: super 3D MOSFET
Author
Sakakibara, Jun ; Suzuki, Naohiro ; Yamaguchi, Hitoshi
Author_Institution
Res. Labs., DENSO Corp., Aichi, Japan
fYear
2002
fDate
2002
Firstpage
233
Lastpage
236
Abstract
In this paper, we present a new conceptual power MOSFET named "super 3D MOSFET", breaking the Ron Si limit under 300 V breakdown voltage. It has a super wide current path in the depth direction of the substrate. The electrical characteristics of this device were verified by 3D device simulation. In the super 3D MOSFET with 30 μm current path width, the simulated results showed that the drift resistance was 6.6 mΩ-mm2 for 70 V breakdown voltage. For this breakdown voltage, the Ron Si limit is 23 mΩ-mm2. The total specific on-resistance containing the other elemental resistances was 19 mΩ-mm2, and even this value was below the Ron Si limit. Moreover, we fabricated the super 3D MOSFET experimentally, and the I-V characteristics were verified.
Keywords
electric current; electric resistance; power MOSFET; semiconductor device breakdown; semiconductor device measurement; semiconductor device models; 30 micron; 300 V; 3D device simulation; I-V characteristics; Si on-resistance limit break-through; breakdown voltage; device simulation; drift resistance; electric characteristics; elemental resistances; power device; specific on-resistance; substrate depth direction; super 3D MOSFET; super wide current path; Contact resistance; Doping; Electric resistance; Electric variables; Electrodes; Laboratories; MOSFET circuits; Neodymium; Power MOSFET; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs, 2002. Proceedings of the 14th International Symposium on
Print_ISBN
0-7803-7318-9
Type
conf
DOI
10.1109/ISPSD.2002.1016214
Filename
1016214
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