• DocumentCode
    1926157
  • Title

    Break-through of the Si limit under 300 V breakdown voltage with new concept power device: super 3D MOSFET

  • Author

    Sakakibara, Jun ; Suzuki, Naohiro ; Yamaguchi, Hitoshi

  • Author_Institution
    Res. Labs., DENSO Corp., Aichi, Japan
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    233
  • Lastpage
    236
  • Abstract
    In this paper, we present a new conceptual power MOSFET named "super 3D MOSFET", breaking the Ron Si limit under 300 V breakdown voltage. It has a super wide current path in the depth direction of the substrate. The electrical characteristics of this device were verified by 3D device simulation. In the super 3D MOSFET with 30 μm current path width, the simulated results showed that the drift resistance was 6.6 mΩ-mm2 for 70 V breakdown voltage. For this breakdown voltage, the Ron Si limit is 23 mΩ-mm2. The total specific on-resistance containing the other elemental resistances was 19 mΩ-mm2, and even this value was below the Ron Si limit. Moreover, we fabricated the super 3D MOSFET experimentally, and the I-V characteristics were verified.
  • Keywords
    electric current; electric resistance; power MOSFET; semiconductor device breakdown; semiconductor device measurement; semiconductor device models; 30 micron; 300 V; 3D device simulation; I-V characteristics; Si on-resistance limit break-through; breakdown voltage; device simulation; drift resistance; electric characteristics; elemental resistances; power device; specific on-resistance; substrate depth direction; super 3D MOSFET; super wide current path; Contact resistance; Doping; Electric resistance; Electric variables; Electrodes; Laboratories; MOSFET circuits; Neodymium; Power MOSFET; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 2002. Proceedings of the 14th International Symposium on
  • Print_ISBN
    0-7803-7318-9
  • Type

    conf

  • DOI
    10.1109/ISPSD.2002.1016214
  • Filename
    1016214