DocumentCode :
1928328
Title :
Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process
Author :
Yagami, K. ; Tsunoda, Masafumi ; Sugano, S. ; Takahashi, M.
Author_Institution :
Tohoku University
fYear :
1999
fDate :
18-21 May 1999
Keywords :
Anisotropic magnetoresistance; Artificial intelligence; Lakes; Magnetic fields; Magnetic films; Microstructure; Sputtering; Temperature; X-ray diffraction; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 1999. Digest of INTERMAG 99. 1999 IEEE International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-5555-5
Type :
conf
DOI :
10.1109/INTMAG.1999.837518
Filename :
837518
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1928328
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