DocumentCode :
1928329
Title :
Group velocity dispersion manipulation in integrated waveguides
Author :
Boggio, J. M. Chavez ; Bodenmuller, D. ; Fremberg, T. ; Bohm, Michael ; Haynes, Richard ; Roth, M.M.
Author_Institution :
innoFSPEC-VKS, Leibniz-Inst. fur Astrophys. Potsdam (AIP), Potsdam, Germany
fYear :
2013
fDate :
12-16 May 2013
Firstpage :
1
Lastpage :
1
Abstract :
The ability to arbitrarily control the chromatic dispersion in CMOS-compatible waveguides should strengthen the viability of this technology, particularly for nonlinear devices on a chip [1]. Here we report on a systematic investigation of group velocity dispersion engineering in channel and rib waveguides with a silicon nitride core (Si3N4). The dispersion control is done by including three cladding layers: the first two are thin (<;400nm) and are made of silica (SiO2) or Si3N4 with refractive indices that can be varied up to 3% with respect to an average value. All this is embedded in a silica cladding. Up to eight parameters can be tuned for dispersion optimization: height and width of the core, thickness and refractive index of the first two claddings, and the type of waveguide (rib or channel). The details of the waveguides under investigation are shown in the inset of Figure 1(a). We have two goals: 1) finding the flattest possible dispersion irrespective of its absolute value, and 2) finding the flattest and lowest dispersion. Figure 1 shows the results after optimizing the eight parameters for the rib and channel waveguide. The flattest dispersion (solid line) is found for the waveguide that includes a silica layer as the first cladding: over a bandwidth of 1000 nm (1350-2450nm) the dispersion is -68 ± 0.6 ps/nm-km. This result demonstrates that appropriate engineering in integrated waveguides produces flattened dispersion profiles comparable as those in photonic crystal fibres [2]. When the silica layer is not included, the flattest dispersion is anomalous (+45 ± 1.5 ps/nm-km) and spans over 700 nm (dotted line). If the goal is having flat and zero dispersion, again the structure with a silica cladding layer (dashed line) provides the best result (2 +/- 2 ps/nm-km over 900 nm). On the other hand the other structure provides flat and low dispersion over 500 nm (dot-dashed line). We a- alyzed what is the main requirement to have ultra-flat dispersion and we observed that the first silica layer allows for a large control of the dispersion flatness and its absolute value. On the other hand, having a rib waveguide or changing the layers refractive indices by a few % can flatten the dispersion, but will not allow for an arbitrary control. This indicates, that it is necessary to have a certain amount of refractive index contrast in order to modify at a great extent the dispersion.
Keywords :
claddings; integrated optics; optical dispersion; optical waveguides; refractive index; rib waveguides; silicon compounds; CMOS-compatible waveguides; Si3N4-SiO2; channel waveguides; chromatic dispersion; group velocity dispersion engineering; integrated waveguides; nonlinear devices; refractive index; rib waveguides; silica cladding layers; silicon nitride core; Bandwidth; Chromatic dispersion; Photonic crystal fibers; Refractive index; Silicon; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe (CLEO EUROPE/IQEC), 2013 Conference on and International Quantum Electronics Conference
Conference_Location :
Munich
Print_ISBN :
978-1-4799-0593-5
Type :
conf
DOI :
10.1109/CLEOE-IQEC.2013.6801464
Filename :
6801464
Link To Document :
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