Title :
Novel asymmetric gate-recess engineering for sub-millimeter-wave InP-based HEMTs
Author :
Shinohara, K. ; Matsui, T. ; Mimura, T. ; Hiyamizu, S.
Author_Institution :
Commun. Res. Lab., Minist. of Posts & Telecommun., Koganei, Japan
Abstract :
A self-aligned asymmetric gate-recess structure for ultra-high speed InGaAs-InAlAs high electron mobility transistors (HEMTs) is successfully fabricated. A 50 nm T-shaped-gate HEMT with a longer drain-side recess exhibits a much-improved maximum oscillation frequency (f/sub max/) of 503 GHz, while retaining a similarly high current-gain cutoff frequency (f/sub t/) of 307 GHz compared to that with a conventional symmetric recess structure. This result indicates reduced electric field between gate and drain while keeping a small source resistance (R/sub s/) in the developed asymmetrically recessed HEMT.
Keywords :
III-V semiconductors; high electron mobility transistors; indium compounds; semiconductor technology; submillimetre wave transistors; 307 GHz; 50 nm; 503 GHz; InGaAs-InAlAs; InP; InP-based HEMTs; T-shaped-gate HEMT; THF; asymmetric gate-recess engineering; asymmetrically recessed HEMT; fabrication process; high current-gain cutoff frequency; high electron mobility transistors; maximum oscillation frequency; self-aligned gate-recess structure; source resistance; submillimeter-wave HEMTs; ultra-high speed HEMTs; Charge carrier density; Cutoff frequency; Electron mobility; HEMTs; Impact ionization; Indium compounds; Indium gallium arsenide; Indium phosphide; MODFETs; Radio frequency;
Conference_Titel :
Microwave Symposium Digest, 2001 IEEE MTT-S International
Conference_Location :
Phoenix, AZ, USA
Print_ISBN :
0-7803-6538-0
DOI :
10.1109/MWSYM.2001.967342