مرکز منطقه ای اطلاع رساني علوم و فناوري - One Mask Process For Stress-buffer And Passivation Applications Using Photosensitive Benzocyclobutene

DocumentCode :

1931063

Title :

One Mask Process For Stress-buffer And Passivation Applications Using Photosensitive Benzocyclobutene

Author :

Strandjord, A.J.G. ; Rogers, W.B. ; Ida, Y. ; Shiau, S. ; Moyer, E.S. ; Scheck, D.M. ; DeVellis, R.R. ; Garrou, P.E.

fYear :

1997

fDate :

16-18 April 1997

Firstpage :

261

Lastpage :

266

Keywords :

Chemicals; Conducting materials; Fuses; Mechanical factors; Packaging; Passivation; Planarization; Polymer films; Resins; Solvents;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

IEMT/IMC Symposium, 1997., 1st [Joint International Electronic Manufacturing Symposium and the International Microelectronics Conference]

Conference_Location :

IEEE

Print_ISBN :

0-7803-4235-6

Type :

conf

Filename :

619017

Link To Document :