DocumentCode :
1931926
Title :
Novel polymer multilayer CMOS compatible technology for multilevel microfludic devices
Author :
Agirregabiria, M. ; Blanco, F.J. ; Berganzo, J. ; Ruano-López, J.M. ; Aranburu, I. ; García, J. ; Mayora, K.
Author_Institution :
MEMS/MST Dept., IKERLAN S. Coop., Arrasate
fYear :
2005
fDate :
2-4 Feb. 2005
Firstpage :
221
Lastpage :
224
Abstract :
This work describes a novel fabrication process based on successive wafer level bonding and releasing steps, that allow us to stack several photopatterned SU-8 layers. Based on a low temperature bonding process, this work enhances it by the use of a Kaptontrade film as one of the substrates where the SU-8 is spun. The lack of adhesion between KaptonTM and SU-8 offers the possibility to release the top substrate after the bonding and continue repeating the same steps to obtain multilayer stacks. Multilevel interconnected microfluidic channels with good sidewall profiles are achieved. In addition, the Kaptontrade releasing step leaves the fabricated structures in contact with the outside simplifying the packaging, which is described in this work
Keywords :
CMOS integrated circuits; microfluidics; multilayers; photolithography; polymer films; wafer bonding; CMOS compatible technology; Kapton film; fabrication process; microfluidic devices; photopatterned SU-8 layers; polymer multilayer; wafer level bonding; Adhesives; Bonding processes; CMOS technology; Fabrication; Microfluidics; Nonhomogeneous media; Polymers; Substrates; Temperature; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices, 2005 Spanish Conference on
Conference_Location :
Tarragona
Print_ISBN :
0-7803-8810-0
Type :
conf
DOI :
10.1109/SCED.2005.1504362
Filename :
1504362
Link To Document :
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