DocumentCode :
1932100
Title :
Choices for the epitaxial growth of GalnP/GaAs dual junction concentrator solar cells
Author :
Garcia, Ivan ; Rey-Stolle, Ignacio ; Galiana, Beatriz ; Algora, Carlos
Author_Institution :
Inst. de Energia Solar, Univ. Politecnica de Madrid, Spain
fYear :
2005
fDate :
2-4 Feb. 2005
Firstpage :
251
Lastpage :
254
Abstract :
In this work we analyse the different possibilities that the GalnP/GaAs double junction solar cell structures grow by MOCVD offers, so as to achieve energy conversion efficiencies higher than 30 %. These possibilities comprise changes in the configuration of layers as well as the variation of the different parameters that affect the epitaxy process, such as temperature, growing time, dopants, partial pressure of gases, etc.
Keywords :
III-V semiconductors; MOCVD; gallium arsenide; gallium compounds; indium compounds; solar cells; vapour phase epitaxial growth; GaInP-GaAs; MOCVD; double junction solar cell structures; energy conversion; epitaxial growth; Doping; Epitaxial growth; Gallium arsenide; Lattices; MOCVD; Materials reliability; Photonic band gap; Photovoltaic cells; Sun; Telecommunications;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices, 2005 Spanish Conference on
Print_ISBN :
0-7803-8810-0
Type :
conf
DOI :
10.1109/SCED.2005.1504371
Filename :
1504371
Link To Document :
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