Title :
The application of limited reaction processing to the deposition of silicon carbide layers
Author :
Ruddell, F.H. ; McNeill, D.W. ; Armstrong, B.M. ; Gamble, H.S.
Author_Institution :
Institute of Advanced Microelectronics, School of Electrical Engineering and Computer Science, The Queen´´s University of Belfast, Ashby Building, Stranmillis Road, Belfast, Northern Ireland, BT9 5AH.
Abstract :
This paper describes the deposition of microcrystalline silicon carbide in an LRP reactor using silane/propane gas chemistry and discusses the performance of heterojunction bipolar transistors using N-SiC emitters.
Keywords :
Cogeneration; Conducting materials; Heterojunctions; Inductors; Lamps; Photonic band gap; Plasma temperature; Silicon carbide; Temperature control; Thermal conductivity;
Conference_Titel :
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location :
Nottingham, England
