DocumentCode
1932551
Title
Recent trends in multilayer process simulation for submicron technologies
Author
Poncet, A. ; Gérodolle, A. ; Martin, S.
Author_Institution
CNET-Grenoble, BP 98. 38243 MEYLAN-Cedex
fYear
1990
fDate
10-13 Sept. 1990
Firstpage
277
Lastpage
286
Abstract
Modelling and algorithmic aspects of process simulation for submicron technologies are addressed, with a special emphasis on multi-dimensional and multilayer applications. A bibliography is attached, which is quite exhaustive over the last three years period.
Keywords
Analytical models; Circuit simulation; Computational modeling; Computer simulation; Discrete event simulation; Integrated circuit modeling; Nonhomogeneous media; Physics computing; Semiconductor process modeling; Solid modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location
Nottingham, England
Print_ISBN
0750300655
Type
conf
Filename
5436358
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