DocumentCode
1932579
Title
Research of metallic films growth processes
Author
Pryanichnikova, Vera V. ; Averin, Igor A. ; Petcherskaya, R. I m a M
Author_Institution
Penza State Univ., Russia
fYear
2003
fDate
1-4 July 2003
Firstpage
56
Lastpage
57
Abstract
In this article, the effect of technological modes on the resistive properties of metallic films is considered. The growth parameters and electrical and physical properties, based on metal alloys, are determined.
Keywords
electric resistance; metallic thin films; vacuum deposited coatings; electrical properties; film resistive properties; growth parameters; metal alloys; metallic film growth processes; nucleation process; physical properties; thermal vacuum deposition; Chemical analysis; Chemical elements; Chromium; Conducting materials; Contacts; Educational institutions; Inorganic materials; Microelectronics; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Materials, 2003. Proceedings. 4th Annual 2003 Siberian Russian Workshop on
Print_ISBN
5-7782-0412-4
Type
conf
DOI
10.1109/SREDM.2003.1224183
Filename
1224183
Link To Document