DocumentCode :
1932579
Title :
Research of metallic films growth processes
Author :
Pryanichnikova, Vera V. ; Averin, Igor A. ; Petcherskaya, R. I m a M
Author_Institution :
Penza State Univ., Russia
fYear :
2003
fDate :
1-4 July 2003
Firstpage :
56
Lastpage :
57
Abstract :
In this article, the effect of technological modes on the resistive properties of metallic films is considered. The growth parameters and electrical and physical properties, based on metal alloys, are determined.
Keywords :
electric resistance; metallic thin films; vacuum deposited coatings; electrical properties; film resistive properties; growth parameters; metal alloys; metallic film growth processes; nucleation process; physical properties; thermal vacuum deposition; Chemical analysis; Chemical elements; Chromium; Conducting materials; Contacts; Educational institutions; Inorganic materials; Microelectronics; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Materials, 2003. Proceedings. 4th Annual 2003 Siberian Russian Workshop on
Print_ISBN :
5-7782-0412-4
Type :
conf
DOI :
10.1109/SREDM.2003.1224183
Filename :
1224183
Link To Document :
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