DocumentCode
1932700
Title
Crystallographic aspects of silicon anisotropic etching
Author
Dikareva, Regina P. ; Zaozemova, S.V. ; Kamenskaya, Anna V. ; Langyeva, Daria A.
Author_Institution
Novosibirsk State Tech. Univ., Russia
fYear
2003
fDate
1-4 July 2003
Firstpage
72
Lastpage
73
Abstract
In this work, research of anisotropic etching (AE) of silicon for the determination of the dominant crystallographic planes, which form islands and etching holes is represented.
Keywords
elemental semiconductors; etching; island structure; semiconductor process modelling; silicon; Si; dominant crystallographic planes; etching holes; islands; silicon anisotropic etching; Anisotropic magnetoresistance; Biomembranes; Crystallography; Data analysis; Etching; Helium; Information analysis; Manufacturing; Paints; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Materials, 2003. Proceedings. 4th Annual 2003 Siberian Russian Workshop on
Print_ISBN
5-7782-0412-4
Type
conf
DOI
10.1109/SREDM.2003.1224188
Filename
1224188
Link To Document