DocumentCode :
1932700
Title :
Crystallographic aspects of silicon anisotropic etching
Author :
Dikareva, Regina P. ; Zaozemova, S.V. ; Kamenskaya, Anna V. ; Langyeva, Daria A.
Author_Institution :
Novosibirsk State Tech. Univ., Russia
fYear :
2003
fDate :
1-4 July 2003
Firstpage :
72
Lastpage :
73
Abstract :
In this work, research of anisotropic etching (AE) of silicon for the determination of the dominant crystallographic planes, which form islands and etching holes is represented.
Keywords :
elemental semiconductors; etching; island structure; semiconductor process modelling; silicon; Si; dominant crystallographic planes; etching holes; islands; silicon anisotropic etching; Anisotropic magnetoresistance; Biomembranes; Crystallography; Data analysis; Etching; Helium; Information analysis; Manufacturing; Paints; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Materials, 2003. Proceedings. 4th Annual 2003 Siberian Russian Workshop on
Print_ISBN :
5-7782-0412-4
Type :
conf
DOI :
10.1109/SREDM.2003.1224188
Filename :
1224188
Link To Document :
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