DocumentCode
1932730
Title
Rib waveguides containing Si nanocrystals embedded in SiO/sub 2/ for optical communication in the visible range
Author
Pellegrino, P. ; Garrido, B. ; Garcia, C. ; Morante, J.R.
Author_Institution
Dept. d´´Electronica, Univ. de Barcelona, Spain
fYear
2005
fDate
2-4 Feb. 2005
Firstpage
327
Lastpage
330
Abstract
We present a study on characterization and modeling of the structural and optical properties of rib-loaded waveguides working in the 600-900 nm spectral range. The active layer was produced by Si + ion implantation into SiO 2. Si-ncs were precipitated by annealing at 1100 °C, forming a 0.4 μm thick core layer in the waveguide. The Si-nc density, size and visible emission and the effective refractive index of the active layer were determined by dedicated experiments. Light propagation in the waveguide was observed at 633 and 780 nm and losses of about 10 dB/cm were been related to specific contributions, mostly geometric-related, and asymptotic values of 2 dB/cm for Mie scattering and 4 dB/cm for direct absorption were evaluated, which are promising for the feasibility of a competitive optical amplifier.
Keywords
Mie scattering; ion implantation; light propagation; nanostructured materials; optical communication; rib waveguides; silicon compounds; 0.4 micron; 1100 C; 600 to 900 nm; Mie scattering; SiO/sub 2/-Si; direct absorption; ion implantation; light propagation; nanocrystals; optical amplifier; optical communication; optical properties; refractive index; rib-loaded waveguides; structural properties; Annealing; Ion implantation; Nanocrystals; Optical fiber communication; Optical refraction; Optical scattering; Optical variables control; Optical waveguides; Particle beam optics; Refractive index;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices, 2005 Spanish Conference on
Conference_Location
Tarragona
Print_ISBN
0-7803-8810-0
Type
conf
DOI
10.1109/SCED.2005.1504394
Filename
1504394
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