DocumentCode :
1932987
Title :
Plasma-related characteristics of a steady-state glow discharge at atmospheric pressure
Author :
Liu, Cong ; Roth
Author_Institution :
UTK Plasma Sci. Lab., Tennessee Univ., Knoxville, TN, USA
fYear :
1993
fDate :
7-9 June 1993
Firstpage :
129
Abstract :
Summary form only given. A large-volume (up to 2.8 liters), low-power (less than 200 W), steady-state glow discharge plasma has been generated which allows many surface modification and other plasma processing operations to be carried out at one atmosphere, rather than in expensive vacuum systems which enforce batch processing. The plasma-related characteristics and surface-treatment applications of this atmospheric pressure, steady-state glow discharge have been examined in the present work. The plasma floating potential is measured as a function of RF frequency, RF voltage, and type of working gas. Helium, a mixture of helium and air, and argon are used as working gases. Surface treatment of organic materials has been carried out. This plasma can modify the physical, chemical, and electrical surface properties of the materials.
Keywords :
glow discharges; Ar; He; RF frequency; RF voltage; plasma floating potential; plasma processing operations; plasma-related characteristics; steady-state glow discharge plasma; surface modification; Atmospheric-pressure plasmas; Glow discharges; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma measurements; Plasma properties; Steady-state; Surface discharges; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
ISSN :
0730-9244
Print_ISBN :
0-7803-1360-7
Type :
conf
DOI :
10.1109/PLASMA.1993.593248
Filename :
593248
Link To Document :
بازگشت