DocumentCode :
1933034
Title :
Trends in Three-Dimensional Integration
Author :
Akasaka, Yoichi
Author_Institution :
Mitsubishi Electric Corp., LSI R&D Laboratory, 4-1 Mizuhara, Itami, 664, Japan
fYear :
1987
fDate :
14-17 Sept. 1987
Firstpage :
265
Lastpage :
273
Abstract :
VLSI will be reaching to the limit of minimization in the 1990s, and after that, further increase of packing density or functions night depend on the vertical integration technology and wafer scale integration. The 3-D ICs consisting of completely stacked active layers offers the flexibility of circuit design and composition of various devices. Three-dimensional (3-D) integration is expected to provide several advantages, such as 1) parallel processing, 2) high-speed operation, 3) high packing density, and 4) multifunctional operation. This will lead upto new system design and the novel functional device. It will become a big trend for VLSI in the next generation.
Keywords :
Capacitors; Insulation; Integrated circuit interconnections; Laboratories; Large scale integration; Parallel processing; Random access memory; Research and development; Three-dimensional integrated circuits; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location :
Bologna, Italy
Print_ISBN :
0444704779
Type :
conf
Filename :
5436382
Link To Document :
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