DocumentCode :
1933043
Title :
Dependence of corona discharge plasma on voltage pulse characteristics
Author :
Chun, S.T. ; Choe ; Boulais ; Irwin, Kent ; Engles, R. ; Brown, Michael
Author_Institution :
US Naval Surface Warfare Center, Silver Spring, MD, USA
fYear :
1993
fDate :
7-9 June 1993
Firstpage :
130
Abstract :
Summary form only given. The dynamical behavior of a corona discharge plasma at atmospheric pressure has been investigated. The plasma is produced in a coaxial chamber of 1-inch inner diameter, where high voltage pulses of 10 to 30 kV are applied. The properties of the discharge plasma depend strongly on the pulse characteristics. At a voltage of less than 15 kV, a corona discharge is produced near the center electrode. Subsequently, as the applied voltage is increased, arcing begins, which appears to be due to the fact that, in the low voltage case, the self energy for instability is not sufficiently high to cause plasma disruption. Though spurious arcing occurs at higher voltages, a glow or sustained plasma dominates as the pulse repetition frequency is increased. The time-resolved discharge data show a monotonically increasing characteristic impedance with nearly constant discharge current. It appears that the plasma at the end of a pulse does not immediately disappear, but remains in the chamber to help ignite plasma at the next pulse as a seed plasma.
Keywords :
corona; 10 to 30 kV; 2.54 cm; arcing; atmospheric pressure; center electrode; characteristic impedance; coaxial chamber; corona discharge plasma; dynamical behavior; high voltage pulses; instability; low voltage case; nearly constant discharge current; pulse characteristics; pulse repetition frequency; seed plasma; self energy; voltage pulse characteristics; Atmospheric-pressure plasmas; Corona; Frequency; Plasma applications; Plasma properties; Plasma transport processes; Silver; Space vector pulse width modulation; Springs; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
ISSN :
0730-9244
Print_ISBN :
0-7803-1360-7
Type :
conf
DOI :
10.1109/PLASMA.1993.593251
Filename :
593251
Link To Document :
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