• DocumentCode
    1933043
  • Title

    Dependence of corona discharge plasma on voltage pulse characteristics

  • Author

    Chun, S.T. ; Choe ; Boulais ; Irwin, Kent ; Engles, R. ; Brown, Michael

  • Author_Institution
    US Naval Surface Warfare Center, Silver Spring, MD, USA
  • fYear
    1993
  • fDate
    7-9 June 1993
  • Firstpage
    130
  • Abstract
    Summary form only given. The dynamical behavior of a corona discharge plasma at atmospheric pressure has been investigated. The plasma is produced in a coaxial chamber of 1-inch inner diameter, where high voltage pulses of 10 to 30 kV are applied. The properties of the discharge plasma depend strongly on the pulse characteristics. At a voltage of less than 15 kV, a corona discharge is produced near the center electrode. Subsequently, as the applied voltage is increased, arcing begins, which appears to be due to the fact that, in the low voltage case, the self energy for instability is not sufficiently high to cause plasma disruption. Though spurious arcing occurs at higher voltages, a glow or sustained plasma dominates as the pulse repetition frequency is increased. The time-resolved discharge data show a monotonically increasing characteristic impedance with nearly constant discharge current. It appears that the plasma at the end of a pulse does not immediately disappear, but remains in the chamber to help ignite plasma at the next pulse as a seed plasma.
  • Keywords
    corona; 10 to 30 kV; 2.54 cm; arcing; atmospheric pressure; center electrode; characteristic impedance; coaxial chamber; corona discharge plasma; dynamical behavior; high voltage pulses; instability; low voltage case; nearly constant discharge current; pulse characteristics; pulse repetition frequency; seed plasma; self energy; voltage pulse characteristics; Atmospheric-pressure plasmas; Corona; Frequency; Plasma applications; Plasma properties; Plasma transport processes; Silver; Space vector pulse width modulation; Springs; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
  • Conference_Location
    Vancouver, BC, Canada
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-1360-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1993.593251
  • Filename
    593251