DocumentCode :
1933085
Title :
P-channel etched-groove Si permeable base transistors
Author :
Gruhle, A. ; Badoz, P.A.
Author_Institution :
CNET, BP98, F-38243 Meylan Cedex, France
fYear :
1990
fDate :
10-13 Sept. 1990
Firstpage :
41
Lastpage :
44
Abstract :
For high-speed complementary logic using permeable base transistors (PBTs) p-channel devices are needed. For the first time the simulation and fabrication of this kind of transistors are reported. Two-dimensional computer modeling indicate that in general p-channel PBTs reach up to 75% of the transit frequency of their n-channel counterparts. First experimental devices with 0.3¿m finger size exhibited a transconductance of 30mS/mm.
Keywords :
CMOS logic circuits; Computer simulation; Doping; Etching; Fabrication; Fingers; Frequency; Logic devices; Solid modeling; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location :
Nottingham, England
Print_ISBN :
0750300655
Type :
conf
Filename :
5436384
Link To Document :
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