DocumentCode :
1933381
Title :
Assessment of SIMOX material by optical waveguide losses
Author :
Kassim, N Mohd ; Ho, H.P. ; Benson, T.M. ; Daveias, D E
Author_Institution :
Department of Electrical and Electronic Engineering, University of Nottingham
fYear :
1990
fDate :
10-13 Sept. 1990
Firstpage :
5
Lastpage :
8
Abstract :
The propagation loss of single-mode optical waveguides in multiple implant SIMOX wafers has been used to assess the quality of the superficial silicon layer. Increased attenuation can be correlated to the creation of thermal and new donors. Some higher loss wafers also show interfacial roughness which gives rise to additional scattering losses.
Keywords :
Optical attenuators; Optical devices; Optical losses; Optical materials; Optical scattering; Optical waveguide components; Optical waveguides; Planar waveguides; Propagation losses; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location :
Nottingham, England
Print_ISBN :
0750300655
Type :
conf
Filename :
5436395
Link To Document :
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