DocumentCode
1933556
Title
TITAN-RTA: a 2D integrated equipment and process model for simulation of rapid thermal processing
Author
Jones, S K ; Gerodolle, A.
Author_Institution
Plessey Research Caswell Ltd, Allen Clark Research Centre, Caswell Towcester, Northants, UK
fYear
1990
fDate
10-13 Sept. 1990
Firstpage
61
Lastpage
64
Abstract
An integrated model for the simulation of the exact thermal behaviour of a silicon wafer during optical rapid thermal processing coupled to the microscopic thermal processing effects of dopant diffusion and oxidation is presented.
Keywords
Error correction; Implants; Lamps; Optical microscopy; Oxidation; Predictive models; Rapid thermal processing; Semiconductor device modeling; Semiconductor process modeling; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location
Nottingham, England
Print_ISBN
0750300655
Type
conf
Filename
5436402
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