DocumentCode
1934175
Title
Nanosecond pulsed corona reactor for efficient destruction of hazardous gases
Author
Korzekwa, R. ; Grothaus, M. ; Hutcherson, K. ; Roush, R. ; Engels, R. ; Brown, Rebecca
fYear
1993
fDate
7-9 June 1993
Firstpage
134
Abstract
Summary form only given. The use of nonthermal plasma reactors for the destruction of hazardous gaseous chemicals shows promise of being highly efficient when compared with thermal techniques. The key to this technique lies in creation of an electric discharge at atmospheric pressure in which the majority of the energy is spent on producing highly energetic electrons rather than on heating of neutral gas molecules. Pulsed corona reactors provide one means of accomplishing this goal. In order to gain some understanding of this approach´s economic and operational viability, and attempt was made to determine and improve the total efficiency of these devices. Determining optimum pulse parameters for the discharge and scaling the device to higher flow rates were the primary focus of the work, with emphasis placed on the use of fast-rising pulses (nanoseconds). An electrically efficient prototype reactor and chemical analysis testbed have been assembled. Preliminary results on device electrical efficiency and chemical destruction efficiencies for chlorofluorocarbons and volatile organic compounds in air.
Keywords
corona; atmospheric pressure; chemical analysis testbed; chemical destruction efficiencies; chlorofluorocarbons; device electrical efficiency; electric discharge; fast-rising pulses; hazardous gaseous chemicals; hazardous gases destruction; highly energetic electrons; nanosecond pulsed corona reactor; nonthermal plasma reactors; optimum pulse parameters; prototype reactor; thermal techniques; total efficiency; volatile organic compounds; Atmospheric-pressure plasmas; Chemical hazards; Chemical reactors; Corona; Electrons; Inductors; Nanoscale devices; Plasma chemistry; Power generation economics; Resistance heating;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location
Vancouver, BC, Canada
ISSN
0730-9244
Print_ISBN
0-7803-1360-7
Type
conf
DOI
10.1109/PLASMA.1993.593396
Filename
593396
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