Title :
Monte Carlo simulation of electron behavior in an electron cyclotron resonance microwave discharge
Author :
Kuo ; Kunhardt, Erich E. ; Kuo, Spencer P.
Author_Institution :
Weber Res. Inst., Polytech. Univ., Farmingdale, NY, USA
Abstract :
Summary form only given. Electron behavior in an electron cyclotron resonance microwave discharge maintained by the TM/sub 01/ mode fields of a cylindrical waveguide has been investigated via a Monte Carlo simulation. Since this discharge has a high degree of ionization (> 1%), a self-consistent simulation of the plasma dynamics is performed using the ponderomotive and Grad-B (-/spl muspl utrisub /spl parB) forces. Accumulation of negative charges on the boundary surface sets up a sheath whose influence is also taken into account. The time averaged, spatially dependent electron energy distribution is computed self-consistently by integrating electron trajectories subject to microwave fields, the divergent background magnetic field, the space charge field, and the sheath field, taking into account electron-electron collisions and collisions with the neutral hydrogen atoms. At low pressures (approximately 0.5 mTorr), the sheath potential is the order of 100 V and decreases with increasing pressure. This observation suggests a pressure range for operation of reactors for diamond-like carbon film deposition.
Keywords :
Monte Carlo methods; 0.5 mtorr; 100 V; ECR; Monte Carlo simulation; TM/sub 01/ mode fields; boundary surface; cylindrical waveguide; divergent background magnetic field; electron behavior; electron cyclotron resonance; electron trajectories; electron-electron collisions; low pressures; microwave discharge; microwave fields; plasma dynamics; ponderomotive forces; self-consistent simulation; sheath field; sheath potential; space charge field; spatially dependent electron energy distribution; Computational modeling; Cyclotrons; Distributed computing; Electrons; Ionization; Plasma sheaths; Plasma simulation; Plasma waves; Resonance; Surface discharges;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593406