DocumentCode :
1934525
Title :
Simulation of Gate-Controlled Double-Injection SOI Structures Application to Micromgnetodiode Sensors
Author :
Dimopoulos, G. ; Balestra, F. ; Chovet, A. ; Benachir, M. ; Brini, J.
Author_Institution :
Alexander Onassis Foundation Scholar, Laboratoire de Physique des Composants A Semiconducteurs (UA-CNRS 840), Institut National Polytechnique de Grenoble, ENSERG, 23 Avenue des Martyrs, 38031 GRENOBLE Cedex, FRANCE
fYear :
1987
fDate :
14-17 Sept. 1987
Firstpage :
241
Lastpage :
244
Abstract :
Among the sensors able to be integrated with VLSI technologies, the gated micromagnetodiode is one of the most attractive magnetic sensors due to its simple design, small size and good sensitivity. Micromagnetodiodes have been fabricated on Silicon-On-Insulator technology. Experimental results concerning magnetic sensitivity, current-voltage characteristics and transconductance are compared to simple models which allow to understand more easily the physical behaviour of gated double-injection devices.
Keywords :
Anodes; Current-voltage characteristics; Magnetic analysis; Magnetic devices; Magnetic films; Magnetic semiconductors; Magnetic sensors; Semiconductor films; Sensor phenomena and characterization; Silicon on insulator technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location :
Bologna, Italy
Print_ISBN :
0444704779
Type :
conf
Filename :
5436445
Link To Document :
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