• DocumentCode
    1934589
  • Title

    Hot-carrier experiments on scaled NMOS transistors

  • Author

    Woltjer, R. ; Paulzen, G.M. ; Woerlec, P.H. ; Juffermans, C.A.H. ; Lifka, H.

  • Author_Institution
    Philips Research Laboratories, 5600 JA Eindhoven, The Netherlands. Tel: 31-40-743551 Fax: 31-40-743390 Telex: 35000 phtc nl nlwtfau
  • fYear
    1990
  • fDate
    10-13 Sept. 1990
  • Firstpage
    249
  • Lastpage
    252
  • Abstract
    Hot-carrier reliability limits the operation voltage for downscaled NMOS transistors. Transistors made according to Quasi Constant Voltage Scaling with design rules between 2.5 ¿m and 0.25 ¿m are tested for reliability and performance. We show that this scaling is in accordance with hot-carrier reliability. The maximal output power (per unit width) is independent of the design rule, but a factor of two more output is possible for LDD transistors. The gate delay appears to be proportional to the design rule, independent of the drain structure.
  • Keywords
    Degradation; Extrapolation; Hot carriers; Laboratories; Lithography; MOSFETs; Power generation; Testing; Transconductance; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
  • Conference_Location
    Nottingham, England
  • Print_ISBN
    0750300655
  • Type

    conf

  • Filename
    5436447