DocumentCode
1934589
Title
Hot-carrier experiments on scaled NMOS transistors
Author
Woltjer, R. ; Paulzen, G.M. ; Woerlec, P.H. ; Juffermans, C.A.H. ; Lifka, H.
Author_Institution
Philips Research Laboratories, 5600 JA Eindhoven, The Netherlands. Tel: 31-40-743551 Fax: 31-40-743390 Telex: 35000 phtc nl nlwtfau
fYear
1990
fDate
10-13 Sept. 1990
Firstpage
249
Lastpage
252
Abstract
Hot-carrier reliability limits the operation voltage for downscaled NMOS transistors. Transistors made according to Quasi Constant Voltage Scaling with design rules between 2.5 ¿m and 0.25 ¿m are tested for reliability and performance. We show that this scaling is in accordance with hot-carrier reliability. The maximal output power (per unit width) is independent of the design rule, but a factor of two more output is possible for LDD transistors. The gate delay appears to be proportional to the design rule, independent of the drain structure.
Keywords
Degradation; Extrapolation; Hot carriers; Laboratories; Lithography; MOSFETs; Power generation; Testing; Transconductance; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location
Nottingham, England
Print_ISBN
0750300655
Type
conf
Filename
5436447
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