DocumentCode :
1934765
Title :
A two-dimensional simulation of a capacitively-coupled parallel-plate RF discharge using a hybrid fluid-Monte Carlo method
Author :
Pak, Hui-Nam ; Riley, M.E.
Author_Institution :
Sandia Nat. Lab., Albuquerque, NM, USA
fYear :
1993
fDate :
7-9 June 1993
Firstpage :
148
Abstract :
Summary form only given, as follows. A 2-D fluid-Monte Carlo hybrid model has been used to simulate a capacitively coupled parallel-plate RF discharge. The 2-D model assumes azimuthal symmetry and accounts for a ground shield about the electrodes as well as grounded chamber walls. The hybrid model consists of a Monte Carlo method for generating rates and a fluid model for transporting electrons and ions. In the fluid model, the electrons are transported using a continuity equation; and the electric fields are solved self-consistently using Poisson´s equation. The Monte Carlo model transports electrons using the fluid-generated periodic electric field. The ionization rates are then obtained using the electron energy distribution function. An averaging method is used to speed up the solution by transporting the ions in a time-averaged electric field with a corrected ambipolar-type diffusion. The simulation switches between the conventional and the averaging fluid model. Typically, the simulation runs from 10´s to 100´s of averaging fluid cycles before reentering the conventional fluid model for 10´s of cycles. Speed increases of a factor of 100 are possible.
Keywords :
Monte Carlo methods; 2-D fluid-Monte Carlo hybrid model; Poisson´s equation; ambipolar-type diffusion; averaging method; azimuthal symmetry; capacitively-coupled parallel-plate RF discharge; continuity equation; electric fields; electron energy distribution function; fluid model; fluid-generated periodic electric field; ground shield; grounded chamber walls; hybrid fluid-Monte Carlo method; ionization rates; time-averaged electric field; two-dimensional simulation; Electrodes; Electrons; Glow discharges; Influenza; Laboratories; Plasma devices; Plasma materials processing; Poisson equations; Radio frequency; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
ISSN :
0730-9244
Print_ISBN :
0-7803-1360-7
Type :
conf
DOI :
10.1109/PLASMA.1993.593423
Filename :
593423
Link To Document :
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