• DocumentCode
    1934867
  • Title

    Development of high power X-band TWTs

  • Author

    Kuang, E. ; Kerslick, G.S. ; Ivers, J.D. ; Schachter, L. ; Nation, J.A.

  • Author_Institution
    Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
  • fYear
    1993
  • fDate
    7-9 June 1993
  • Firstpage
    150
  • Abstract
    Summary form only given. A program to develop high-power X-band traveling wave tube amplifiers using relativistic electron beams (0.8-1.0 MV, 0.8-1.8 kA, 70-100 ns) is in progress. At output power levels in excess of 70 MW the development of asymmetric sidebands has been observed. Extensive analytical work suggests that this phenomenon is caused by the large energy spread that develops in the electron distribution during the interaction process. This energy spread excites a broad spectrum of noise as the modulated electron beam enters the second stage of the amplifier. Reflections from the ends of these structures cause only selected frequencies to be transmitted through the device, leading to the observed sidebands. To reduce the effect of reflections, and thus the development of sidebands, narrow passband structures with passband /spl sim/200 MHz are being used. These structures typically have group velocity /spl sim/0.01c. This value ensures that the feedback time from any reflections is comparable to the beam pulse duration. Measurements using these structures show gains over a narrow bandwidth with no evidence of sidebands.
  • Keywords
    relativistic electron beam tubes; 0.8 to 1 MV; 0.8 to 1.8 kA; 200 MHz; 70 MW; 70 to 100 ns; asymmetric sidebands; beam pulse duration; electron distribution; energy spread; feedback time; gains; high power X-band TWTs; interaction process; passband structures; relativistic electron beams; traveling wave tube amplifiers; Acoustic reflection; Electron beams; Electron tubes; Frequency; High power amplifiers; Optical modulation; Optical reflection; Passband; Power amplifiers; Power generation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
  • Conference_Location
    Vancouver, BC, Canada
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-1360-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1993.593428
  • Filename
    593428