Title :
Limitations and Use of Analytical Techniques for ULSI
Author :
Vandervorst, W. ; Bender, H.
Author_Institution :
Imec, Belgium
Abstract :
The applications and use of analytical techniques in ULSI are discussed in this paper. Emphasis is on the use of RBS, AES, ESCA, SIMS, SRP with respect to routine analysis requirements in semiconductor processing. The techniques are reviewed through recent applications whereby the emphasis is placed on new developments and limitations as encountered when applying the techniques to small area or 2D-analysis.
Keywords :
Chemical analysis; Chemical elements; Information analysis; Performance analysis; Performance evaluation; Probes; Silicon; Spatial resolution; Sputtering; Ultra large scale integration;
Conference_Titel :
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location :
Berlin, Germany
