Title :
PASOTRON amplifier experiments
Author :
Butler, J.M. ; Goebel, Dan M. ; Summer, P.W. ; Gregoire, D.J. ; Eisenhart, R.L.
Author_Institution :
Hughes Res. Labs., Malibu, CA, USA
Abstract :
Summary form only given. Experimental studies on a single-stage microwave amplifier based on Hughes´ plasma assisted, slow-wave oscillator technology (PASOTRON) are reported. The high-energy microwave amplifier employed in these studies utilizes a plasma-cathode electron-gun, and a plasma-filled slow-wave structure (SWS), to produce and propagate > 100-/spl mu/sec-long, 50-to-100 kV, 80-to-120-A electron-beam pulses without the use of any applied axial magnetic fields. The long-electron-beam pulses are coupled with a 120-/spl mu/sec-long, 10.1-GHz RF-drive signal provided by a 3-kW klystron. As the beam and the drive signal propagate through the SWS, amplification of the input-RF-drive signal is achieved. Amplified power levels of 3-to-7 kW have been achieved to date at maximum efficiencies of only 0.11%. However, measurements of the amplifier gain reveals signal level increases of 17 dB. Preliminary analysis of these results suggests that a frequency-dependent insertion loss of the present SWS when operated near the TM/sub 01/ mode´s upper cut-off frequency may be responsible for the amplifier´s low measured output power and efficiency, but high system gain.
Keywords :
microwave amplifiers; 10.1 GHz; 100 mus; 120 mus; 17 dB; 3 kW; 50 to 100 kV; 80 to 120 A; Hughes´ plasma assisted slow-wave oscillator; PASOTRON amplifier experiments; TM/sub 01/ mode´s upper cut-off frequency; amplifier gain; efficiency; electron-beam pulses; frequency-dependent insertion loss; high-energy microwave amplifier; klystron; long-electron-beam pulses; output power; plasma-cathode electron-gun; plasma-filled slow-wave structure; single-stage microwave amplifier; Cutoff frequency; Gain measurement; Klystrons; Magnetic fields; Microwave amplifiers; Microwave oscillators; Microwave propagation; Microwave technology; Plasmas; Pulse amplifiers;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593444