DocumentCode :
1935504
Title :
Analysis of the Punchthrough Effect in Walled Emitter Bipolar Transistors
Author :
Dubois, Emmanuel ; Baccus, Biuno ; Collard, Dominique
Author_Institution :
Institut Supérieur d´´Electronique du Nord, 41, Boulevard Vauban 59046 LILLE Cedex, France
fYear :
1989
fDate :
11-14 Sept. 1989
Firstpage :
789
Lastpage :
792
Abstract :
A detailed study of the punchthrough formation mechanism induced by the walled emitter configuration is proposed. Efficient process and device simulation tools -IMPACT- have been used and results have been successfully compared to measured characteristics.
Keywords :
Bipolar transistor circuits; Bipolar transistors; Character generation; Circuit simulation; Impurities; Mesh generation; Shape control; Shape measurement; Silicon; Solid modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location :
Berlin, Germany
Print_ISBN :
0387510001
Type :
conf
Filename :
5436482
Link To Document :
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