DocumentCode
1935504
Title
Analysis of the Punchthrough Effect in Walled Emitter Bipolar Transistors
Author
Dubois, Emmanuel ; Baccus, Biuno ; Collard, Dominique
Author_Institution
Institut Supérieur d´´Electronique du Nord, 41, Boulevard Vauban 59046 LILLE Cedex, France
fYear
1989
fDate
11-14 Sept. 1989
Firstpage
789
Lastpage
792
Abstract
A detailed study of the punchthrough formation mechanism induced by the walled emitter configuration is proposed. Efficient process and device simulation tools -IMPACT- have been used and results have been successfully compared to measured characteristics.
Keywords
Bipolar transistor circuits; Bipolar transistors; Character generation; Circuit simulation; Impurities; Mesh generation; Shape control; Shape measurement; Silicon; Solid modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location
Berlin, Germany
Print_ISBN
0387510001
Type
conf
Filename
5436482
Link To Document