Title :
Sputter-deposited FeCoBC/AlN/sub x/ multilayered films for wet-etching process
Author :
Tomita, H. ; Inoue, Takeru ; Mizoguchi, T. ; Sato, T.
Author_Institution :
TOSHIBA Corp.
Keywords :
Aluminum; Amorphous materials; Annealing; Conductivity; Darmstadtium; Eddy currents; Electric resistance; Etching; Nitrogen; Sputtering;
Conference_Titel :
Magnetics Conference, 1999. Digest of INTERMAG 99. 1999 IEEE International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-5555-5
DOI :
10.1109/INTMAG.1999.837929
