Title :
Comparison Between Different Intermetallic Dielectric Processes and Consequences on Field Transistor Behaviour
Author :
Deleonibus, Simon ; Arena, C. ; Heitzmann, M. ; Martin, F. ; Lajzerowicz, J. ; Vinet, F.
Author_Institution :
LETI CENG Avenue des Martyrs, 38041 Grenoble Cedex France.
Keywords :
Aluminum; Channel bank filters; Dielectrics; Hydrogen; Intermetallic; MOS devices; Metal-insulator structures; Random access memory; Voltage; Wet etching;
Conference_Titel :
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location :
Berlin, Germany
